Sputtering Explained | Thin Film Deposition Using Plasma in Nanotechnology
1:24
YouTubeScience Tech Engineering and Math with Dr. Tiwari
Sputtering Explained | Thin Film Deposition Using Plasma in Nanotechnology
In this video, Prof. Ashutosh Tiwari explains the principle of sputtering, a key physical vapor deposition (PVD) method used to create thin films and coatings. In sputtering, a plasma of energetic ions bombards a solid target, ejecting atoms that deposit onto a substrate to form a thin film. Learn about the different sputtering modes — DC ...
1.3K views1 month ago
Sputtering Process
Sputtering is a key technique in thin film deposition, widely utilized in semiconductor manufacturing, optical coatings, and advanced materials research to deposit thin, uniform films onto… | Rahul Goyal, Ph.D.
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