Researchers have developed a one-step, facile method to pattern graphene by using stencil mask and oxygen plasma reactive-ion etching, and subsequent polymer-free direct transfer to flexible ...
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Eco-friendly method enables direct patterning of 2D semiconductors for advanced circuits
Researchers have introduced a novel technique that allows for the direct patterning of two-dimensional (2D) semiconductor materials onto substrates without the need for complex processes. The ...
(a) TEM image of the ultra-fine NiS nanorods with diameter of ~2.7 nm. (b) ADF-STEM image and (c) corresponding FFT pattern of the ultra-fine nanorod in radial direction. (d) ADF-STEM image and (e) ...
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